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APA Citation
Watanabe, T., Yamada, A., Saito, A., Sakurai, A., & Habuka, H. (2017). parallel langmuir processes for silicon epitaxial growth in a SiHCl3-SiHx-H2 system. Materials science in semiconductor processing, 72, 134–138. http://access.bl.uk/ark:/81055/vdc_100050621440.0x000015