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HARVARD Citation
Watanabe, T. et al. (2017). Parallel langmuir processes for silicon epitaxial growth in a SiHCl3-SiHx-H2 system. Materials science in semiconductor processing. pp. 134-138. [Online].
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Watanabe, T. et al. (2017). Parallel langmuir processes for silicon epitaxial growth in a SiHCl3-SiHx-H2 system. Materials science in semiconductor processing. pp. 134-138. [Online].