Cite
MLA Citation
Samuel D. Cosham et al.. “Precursors for p‐Type Nickel Oxide: Atmospheric‐Pressure Metal–Organic Chemical‐Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions.” European journal of inorganic chemistry, no. 13, 2017, pp. 1868–1876. http://access.bl.uk/ark:/81055/vdc_100045410503.0x000026