Cite
HARVARD Citation
Rizquez, M. et al. (2015). Plasma-Reactor Wall Interactions: Bromine-Fluorine Chemistry Duality in an Industrial Dry Etch Process. MRS proceedings. p. . [Online].
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Rizquez, M. et al. (2015). Plasma-Reactor Wall Interactions: Bromine-Fluorine Chemistry Duality in an Industrial Dry Etch Process. MRS proceedings. p. . [Online].