The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode. (June 2016)
- Record Type:
- Journal Article
- Title:
- The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode. (June 2016)
- Main Title:
- The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode
- Authors:
- Yu, D.Q.
Lau, W.S.
Wong, Hei
Feng, Xuan
Dong, Shurong
Pey, K.L. - Abstract:
- Abstract: In this paper, we will report that the leakage current characteristics can be a function of the bottom electrode. The variation of the bottom tungsten electrode thickness can affect the leakage current characteristics of W/Ta2 O5 /W MIM capacitors mainly through two mechanisms. The first mechanism is that the Ta2 O5 CVD process can be influenced by the W bottom electrode thickness. Experimentally it was observed that the thickness of the Ta2 O5 film deposited by CVD is noticeably different for samples with different bottom W electrodes with different thicknesses. The second mechanism is that the surface roughness of the bottom W electrode increases with increasing thickness, resulting in a smaller effective Schottky barrier height. A smaller effective Schottky barrier height will lead to larger leakage current. Highlights: The leakage current characteristics can be a function of the bottom electrode of the MIM structure. The thickness of the bottom electrode affects the leakage current characteristics through two mechanisms. The thickness of the bottom W layer can affect Ta2 O5 layer CVD process. Rougher surface of the bottom W electrode can result in a smaller effective Schottky barrier height.
- Is Part Of:
- Microelectronics and reliability. Volume 61(2016)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 61(2016)
- Issue Display:
- Volume 61, Issue 2016 (2016)
- Year:
- 2016
- Volume:
- 61
- Issue:
- 2016
- Issue Sort Value:
- 2016-0061-2016-0000
- Page Start:
- 95
- Page End:
- 98
- Publication Date:
- 2016-06
- Subjects:
- Ta2O5 -- Surface roughness -- Surface smoothing -- Effective Schottky barrier height
Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2016.02.013 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 2383.xml