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APA Citation
Gu 顾, Z. 张., Liu 刘, Y. 玉., Gao 高, B. 宝., Wang 王, C. 辰., & Deng 邓, H. 海. (n.d.). a novel compound cleaning solution for benzotriazole removal after copper CMP*Project supported by the Special Project Items No.2 in National Long-Term Technology Development Plan, China (Nos. 2009ZX02308-003, 2014ZX02301003-007).. Journal of semiconductors, 36, . http://access.bl.uk/ark:/81055/vdc_100028692667.0x00004d