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HARVARD Citation
Belmahi, M. et al. (n.d.). Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture. Plasma processes and polymers. 11 (6), pp. 551-558. [Online].