Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture. Issue 6 (19th March 2014)
- Record Type:
- Journal Article
- Title:
- Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture. Issue 6 (19th March 2014)
- Main Title:
- Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture
- Authors:
- Belmahi, Mohammed
Bulou, Simon
Thouvenin, Amanda
de Poucques, Ludovic
Hugon, Robert
Le Brizoual, Laurent
Miska, Patrice
Genève, Damien
Vasseur, Jean‐Luc
Bougdira, Jamal - Abstract:
- <abstract abstract-type="main" xml:lang="en"> <title>Abstract</title> <sec id="ppap201300166-sec-0001" sec-type="section"> <p>SiC<sub><italic>x</italic></sub>N<sub><italic>y</italic></sub>:H thin films are obtained with the microwave plasma assisted chemical vapour deposition (MPACVD) method in the gas mixture H<sub>2</sub>/Ar/Hexamethyldisilazane. When very few amounts of nitrogen are added to the gas mixture, the film composition changes drastically from SiC<sub><italic>x</italic></sub>:H like films to SiN<sub><italic>x</italic></sub>:H like films, according to X‐rays Photoelectron Spectroscopy and Fourier Transform Infra‐Red Spectroscopy (FTIR) analysis. The refractive index (<italic>n</italic>) and Tauc's optical gap (<italic>E</italic><sub>g</sub>) are modified over a wide range of values (1.75 ≤ <italic>n</italic> ≤ 2.15 and 3.5 eV ≤ <italic>E</italic><sub><italic>g</italic></sub> ≤ 5 eV) with nitrogen addition to the feed gas leading to thin films optical constants close to those of SiC or Si<sub>3</sub>N<sub>4</sub>. Therefore, for the films obtained without nitrogen, SiC nanoparticles with a size of about 20 nm embedded in an amorphous SiCN:H matrix are synthesized, leading to nanocomposite films.<inline-graphic xlink:href="ark:/27927/pghmhk0w7d" content-type="ppap201300166-gra-0001" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></p> </sec> </abstract>
- Is Part Of:
- Plasma processes and polymers. Volume 11:Issue 6(2014:Jun.)
- Journal:
- Plasma processes and polymers
- Issue:
- Volume 11:Issue 6(2014:Jun.)
- Issue Display:
- Volume 11, Issue 6 (2014)
- Year:
- 2014
- Volume:
- 11
- Issue:
- 6
- Issue Sort Value:
- 2014-0011-0006-0000
- Page Start:
- 551
- Page End:
- 558
- Publication Date:
- 2014-03-19
- Subjects:
- Plasma polymerization -- Periodicals
Plasma-enhanced chemical vapor deposition -- Periodicals
Plasma chemistry -- Periodicals - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869 ↗
http://www3.interscience.wiley.com/cgi-bin/jtoc/106571203 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/ppap.201300166 ↗
- Languages:
- English
- ISSNs:
- 1612-8850
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6528.781000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 3338.xml