Cite
HARVARD Citation
Shim, S. et al. (2018) Physical design and mask synthesis for directed self-assembly lithography. [Online]. Cham, Switzerland : Springer. Available from: http://access.bl.uk/ark:/81055/vdc_100069705917.0x000001
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Shim, S. et al. (2018) Physical design and mask synthesis for directed self-assembly lithography. [Online]. Cham, Switzerland : Springer. Available from: http://access.bl.uk/ark:/81055/vdc_100069705917.0x000001