1. A controllable and efficient method for the fabrication of a single HfC nanowire field-emission point electron source aided by low keV FIB milling. Issue 32 (1st July 2020) Authors: Tang, Shuai; Tang, Jie; Chiu, Ta-Wei; Uzuhashi, Jun; Tang, Dai-Ming; Ohkubo, Tadakatsu; Mitome, Masanori; Uesugi, Fumihiko; Takeguchi, Masaki; Qin, Lu-Chang Journal: Nanoscale Issue: Volume 12:Issue 32(2020) Page Start: 16770 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Accurate determination of strains at layered materials by selected area electron diffraction mapping. (13th June 2019) Authors: Bekarevich, Raman; Mitsuishi, Kazutaka; Ohnishi, Tsuyoshi; Mano, Takaaki; Uesugi, Fumihiko; Takeguchi, Masaki Journal: Japanese journal of applied physics Issue: Volume 58:Number SI(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Chalcogenide Materials Engineering for Phase‐Change Memory and Future Electronics Applications: From Sb–Te to Bi–Te. Issue 3 (15th October 2020) Authors: Saito, Yuta; Mitrofanov, Kirill V.; Makino, Kotaro; Fons, Paul; Kolobov, Alexander V.; Tominaga, Junji; Uesugi, Fumihiko; Takeguchi, Masaki Journal: Physica status solidi Issue: Volume 15:Issue 3(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Chalcogenide Materials Engineering for Phase‐Change Memory and Future Electronics Applications: From Sb–Te to Bi–Te. Issue 3 (15th October 2020) Authors: Saito, Yuta; Mitrofanov, Kirill V.; Makino, Kotaro; Fons, Paul; Kolobov, Alexander V.; Tominaga, Junji; Uesugi, Fumihiko; Takeguchi, Masaki Other Names: Noé Pierre guestEditor.; Kooi Bart J. guestEditor.; Wuttig Matthias guestEditor. Journal: Physica status solidi Issue: Volume 15:Issue 3(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Classification for transmission electron microscope images from different amorphous states using persistent homology. (16th February 2022) Authors: Uesugi, Fumihiko; Ishii, Masashi Journal: Microscopy Issue: Volume 71:Number 3(2022) Page Start: 161 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Compositional tuning in sputter-grown highly-oriented Bi–Te films and their optical and electronic structures. Issue 39 (3rd October 2017) Authors: Saito, Yuta; Fons, Paul; Makino, Kotaro; Mitrofanov, Kirill V.; Uesugi, Fumihiko; Takeguchi, Masaki; Kolobov, Alexander V.; Tominaga, Junji Journal: Nanoscale Issue: Volume 9:Issue 39(2017) Page Start: 15115 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Development and evaluation of magnesium oxide-based ceramics for chamber parts in mass-production plasma etching equipment. (28th April 2017) Authors: Kasashima, Yuji; Tsutsumi, Kota; Mitomi, Shinzo; Uesugi, Fumihiko Journal: Japanese journal of applied physics Issue: Volume 56:Number 6(2017)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Electrical conduction and field emission of a single-crystalline GdB44Si2 nanowire. Issue 35 (28th August 2020) Authors: Tang, Shuai; Tang, Jie; Chiu, Ta-Wei; Yuan, Jinshi; Tang, Dai-Ming; Mitome, Masanori; Uesugi, Fumihiko; Nemoto, Yoshihiro; Takeguchi, Masaki; Qin, Lu-Chang Journal: Nanoscale Issue: Volume 12:Issue 35(2020) Page Start: 18263 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Feasibility study of detection of dielectric breakdown of gate oxide film by using acoustic emission method. (7th November 2016) Authors: Kasashima, Yuji; Tabaru, Tatsuo; Uesugi, Fumihiko Journal: Japanese journal of applied physics Issue: Volume 55:Number 12(2016:Dec.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system. (1st May 2015) Authors: Kasashima, Yuji; Kurita, Hiroyuki; Kimura, Naoya; Ando, Akira; Uesugi, Fumihiko Journal: Japanese journal of applied physics Issue: Volume 54:Number 6(2015:Jun.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗