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1. An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly. Issue 23 (31st May 2018)

2. Block copolymer technology applied to nanoelectronics. Issue 9 (16th August 2013)

3. Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration. Issue 1750 (16th March 2015)

5. Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals. (22nd November 2012)

6. Reducing the crystallinity of PCL chains by copolymerization with substituted δ/ε-lactones and its impact on the phase separation of PCL-based block copolymers. Issue 15 (31st March 2022)

7. Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography. (23rd April 2023)

8. Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films. (10th November 2014)