Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals. (22nd November 2012)

• Record Type: Journal Article
• Authors: Aissou, Karim; Shaver, Jonah; Fleury, Guillaume; Pécastaings, Gilles; Brochon, Cyril; Navarro, Christophe; Grauby, Stéphane; Rampnoux, Jean‐Michel; Dilhaire, Stefan; Hadziioannou, Georges
• Is Part Of: Advanced materials. Volume 25:Number 2(2013)
• Page Start: 213
• Page End: 217
• Publication Date: 2012-11-22
• Subjects: Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201203254
• Languages: English
• ISSNs: 0935-9648

Abstract

<abstract abstract-type="graphical" xml:lang="en"> <title> <x xml:space="preserve">Abstract</x> </title> <p> <bold>We have overcome the cost and time consumption limitations of common lithography techniques</bold> used to control the self‐assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub‐layer. The guiding pattern is a sinusoidal surface‐relief grating interferometrically inscribed onto an azobenzene containing copolymer sub‐layer leading to a defect‐free single grain of block copolymer domains. <boxed-text content-type="graphic" position="anchor" orientation="portrait"><graphic position="anchor" mimetype="image" xlink:href="ark:/27927/pgg1p96jvkc" orientation="portrait" xlink:type="simple" xmlns:xlink="http://www.w3.org/1999/xlink" /></boxed-text></p> </abstract>