Author/Creator: Muroi, Mitsuko - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Muroi, Mitsuko

1. Advantages of a slim vertical gas channel at high SiHCl3 concentrations for atmospheric pressure silicon epitaxial growth. (15th November 2018)

Authors:: Irikura, Kenta; Muroi, Mitsuko; Yamada, Ayami; Matsuo, Miya; Habuka, Hitoshi; Ishida, Yuuki; Ikeda, Shin-Ichi; Hara, Shiro
Journal:: Materials science in semiconductor processing
Issue:: Volume 87(2018)
Page Start:: 13
Record Type:: Journal Article
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2. Boron-Silicon Film Chemical Vapor Deposition Using Boron Trichloride, Dichlorosilane and Monomethylsilane Gases. (16th June 2021)

Authors:: Muroi, Mitsuko; Otani, Mana; Habuka, Hitoshi
Journal:: ECS journal of solid state science and technology
Issue:: Volume 10:Number 6(2021)
Page Start:
Record Type:: Journal Article
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3. Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor. (February 2020)

Authors:: Takahashi, Toshinori; Otani, Mana; Muroi, Mitsuko; Irikura, Kenta; Matsuo, Miya; Yamada, Ayami; Habuka, Hitoshi; Ishida, Yuuki; Ikeda, Shin-Ichi; Hara, Shiro
Journal:: Materials science in semiconductor processing
Issue:: Volume 106(2020)
Page Start:
Record Type:: Journal Article
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4. Real time evaluation of silicon epitaxial growth process by exhaust gas measurement using quartz crystal microbalance. (December 2018)

Authors:: Muroi, Mitsuko; Matsuo, Miya; Habuka, Hitoshi; Ishida, Yuuki; Ikeda, Shin-Ichi; Hara, Shiro
Journal:: Materials science in semiconductor processing
Issue:: Volume 88(2018)
Page Start:: 192
Record Type:: Journal Article
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5. Silicon epitaxial growth accelerated by parallel Langmuir processes using SiH2Cl2 and SiH3CH3 gases. (26th July 2018)

Authors:: Yamada, Ayami; Muroi, Mitsuko; Watanabe, Toru; Saito, Ayumi; Sakurai, Ayumi; Habuka, Hitoshi
Journal:: Semiconductor science and technology
Issue:: Volume 33:Number 9(2018:Sep.)
Page Start:
Record Type:: Journal Article
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6. Transport phenomena in a slim vertical atmospheric pressure chemical vapor deposition reactor utilizing natural convection. (15th November 2017)

Authors:: Yamada, Ayami; Li, Ning; Matsuo, Miya; Muroi, Mitsuko; Habuka, Hitoshi; Ishida, Yuuki; Ikeda, Shin-Ichi; Hara, Shiro
Journal:: Materials science in semiconductor processing
Issue:: Volume 71(2017)
Page Start:: 348
Record Type:: Journal Article
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