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Author/Creator Lewis, Scott M.

2. Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography. (27th May 2022)

Authors:
Lewis, Scott M.; DeRose, Guy A.; Alty, Hayden R.; Hunt, Matthew S.; Lee, Nathan; Mann, James A.; Grindell, Richard; Wertheim, Alex; De Rose, Lucia; Fernandez, Antonio; Muryn, Christopher A.; Whitehead, George F. S.; Timco, Grigore A.; Scherer, Axel; Winpenny, Richard E. P.
Journal:
Advanced functional materials
Issue:
Volume 32:Number 32(2022)
Page Start:
n/a
Record Type:
Journal Article
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Available online (eLD content is only available in our Reading Rooms) ↗

3. Use of Supramolecular Assemblies as Lithographic Resists. Issue 24 (15th May 2017)

Authors:
Lewis, Scott M.; Fernandez, Antonio; DeRose, Guy A.; Hunt, Matthew S.; Whitehead, George F. S.; Lagzda, Agnese; Alty, Hayden R.; Ferrando‐Soria, Jesus; Varey, Sarah; Kostopoulos, Andreas K.; Schedin, Fredrik; Muryn, Christopher A.; Timco, Grigore A.; Scherer, Axel; Yeates, Stephen G.; Winpenny, R...
Journal:
Angewandte Chemie international edition
Issue:
Volume 56:Issue 24(2017)
Page Start:
6749
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

4. Use of Supramolecular Assemblies as Lithographic Resists. (15th May 2017)

Authors:
Lewis, Scott M.; Fernandez, Antonio; DeRose, Guy A.; Hunt, Matthew S.; Whitehead, George F. S.; Lagzda, Agnese; Alty, Hayden R.; Ferrando‐Soria, Jesus; Varey, Sarah; Kostopoulos, Andreas K.; Schedin, Fredrik; Muryn, Christopher A.; Timco, Grigore A.; Scherer, Axel; Yeates, Stephen G.; Winpenny, R...
Journal:
Angewandte Chemie
Issue:
Volume 129:Number 24(2017)
Page Start:
6853
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗