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You searched for: Author/Creator Lebedev, Mikhail V.

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2. Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis. Issue 29 (7th July 2020)

9. Photoanodic pyramid texturization of n-Ge(100) in HCl solution: unexpected anisotropy in the surface chemistry of etching. Issue 16 (8th April 2019)

10. Photoanodic pyramid texturization of n-Ge(100) in HCl solution: unexpected anisotropy in the surface chemistry of etching. Issue 16 (8th April 2019)