Author/Creator: Dussart, R - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Dussart, R

1. Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas. (30th September 2015)

Authors:: Leroy, F; Zhang, L; Tillocher, T; Yatsuda, K; Maekawa, K; Nishimura, E; Lefaucheux, P; de Marneffe, J-F; Baklanov, M R; Dussart, R
Journal:: Journal of physics
Issue:: Volume 48:Number 43(2015)
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Record Type:: Journal Article
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2. Direct current microhollow cathode discharges on silicon devices operating in argon and helium. (6th February 2018)

Authors:: Michaud, R; Felix, V; Stolz, A; Aubry, O; Lefaucheux, P; Dzikowski, S; Schulz-von der Gathen, V; Overzet, L J; Dussart, R
Journal:: Plasma sources science & technology
Issue:: Volume 27:Number 2(2018:Apr.)
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Record Type:: Journal Article
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3. On the validity of neutral gas temperature by emission spectroscopy in micro-discharges close to atmospheric pressure. (29th May 2019)

Authors:: Iseni, S; Michaud, R; Lefaucheux, P; Sretenović, G B; Schulz-von der Gathen, V; Dussart, R
Journal:: Plasma sources science & technology
Issue:: Volume 28:Number 6(2019:Jun.)
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Record Type:: Journal Article
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4. Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation. (17th August 2015)

Authors:: Gosset, N; Boufnichel, M; Bahette, E; Khalfaoui, W; Ljazouli, R; Grimal-Perrigouas, V; Dussart, R
Journal:: Journal of micromechanics and microengineering
Issue:: Volume 25:Number 9(2015:Sep.)
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Record Type:: Journal Article
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5. The effect of SF6 addition in a Cl2/Ar inductively coupled plasma for deep titanium etching. (8th March 2018)

Authors:: Laudrel, E; Tillocher, T; Meric, Y; Lefaucheux, P; Boutaud, B; Dussart, R
Journal:: Journal of micromechanics and microengineering
Issue:: Volume 28:Number 5(2018:May)
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Record Type:: Journal Article
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