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Author/Creator Douhard, B.

2. Editors' Choice—Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures. (1st January 2018)

Authors:
Loo, R.; Arimura, H.; Cott, D.; Witters, L.; Pourtois, G.; Schulze, A.; Douhard, B.; Vanherle, W.; Eneman, G.; Richard, O.; Favia, P.; Mitard, J.; Mocuta, D.; Langer, R.; Collaert, N.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 7:Number 2(2018)
Page Start:
P66
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

3. Editors' Choice—Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures. (20th January 2018)

Authors:
Loo, R.; Arimura, H.; Cott, D.; Witters, L.; Pourtois, G.; Schulze, A.; Douhard, B.; Vanherle, W.; Eneman, G.; Richard, O.; Favia, P.; Mitard, J.; Mocuta, D.; Langer, R.; Collaert, N.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 7:Number 2(2018)
Page Start:
P66
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

4. Very Low Temperature Epitaxy of Group-IV Semiconductors for Use in FinFET, Stacked Nanowires and Monolithic 3D Integration. (12th July 2019)

Authors:
Porret, C.; Hikavyy, A.; Granados, J. F. Gomez; Baudot, S.; Vohra, A.; Kunert, B.; Douhard, B.; Bogdanowicz, J.; Schaekers, M.; Kohen, D.; Margetis, J.; Tolle, J.; Lima, L. P. B.; Sammak, A.; Scappucci, G.; Rosseel, E.; Langer, R.; Loo, R.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 8:Number 8(2019)
Page Start:
P392
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

5. Very Low Temperature Epitaxy of Group-IV Semiconductors for Use in FinFET, Stacked Nanowires and Monolithic 3D Integration. (1st January 2019)

Authors:
Porret, C.; Hikavyy, A.; Granados, J. F. Gomez; Baudot, S.; Vohra, A.; Kunert, B.; Douhard, B.; Bogdanowicz, J.; Schaekers, M.; Kohen, D.; Margetis, J.; Tolle, J.; Lima, L. P. B.; Sammak, A.; Scappucci, G.; Rosseel, E.; Langer, R.; Loo, R.
Journal:
ECS journal of solid state science and technology
Issue:
Volume 8:Number 8(2019)
Page Start:
P392
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗