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3. A Fully Automated High-Throughput Flow Cytometry Screening System Enabling Phenotypic Drug Discovery. (August 2018)

6. Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching. Issue 9 (22nd May 2019)

7. Growth Mechanism of a Hybrid Structure Consisting of a Graphite Layer on Top of Vertical Carbon Nanotubes. (9th September 2012)

9. Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation. (1st April 2016)