11. Enhanced dynamic threshold voltage UTBB SOI nMOSFETs. (October 2015) Authors: Sasaki, K.R.A.; Manini, M.B.; Simoen, E.; Claeys, C.; Martino, J.A. Journal: Solid-state electronics Issue: Volume 112(2015) Page Start: 19 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
12. Identification of Si film traps in p-channel SOI FinFETs using low temperature noise spectroscopy. (October 2015) Authors: Achour, H.; Cretu, B.; Simoen, E.; Routoure, J.-M.; Carin, R.; Benfdila, A.; Aoulaiche, M.; Claeys, C. Journal: Solid-state electronics Issue: Volume 112(2015) Page Start: 1 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
13. Impact of processing and back-gate biasing conditions on the low-frequency noise of ultra-thin buried oxide silicon-on-insulator nMOSFETs. (March 2015) Authors: Kudina, V.; Garbar, N.; Simoen, E.; Claeys, C. Journal: Solid-state electronics Issue: Volume 105(2015) Page Start: 37 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
14. Improved physics-based analysis to discriminate the flicker noise origin at very low temperature and drain voltage polarization. (September 2020) Authors: Cretu, B.; Boudier, D.; Simoen, E.; Veloso, A.; Collaert, N.; Claeys, C. Journal: Solid-state electronics Issue: Volume 171(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
15. Improvement of the sound absorption of flexible micro-perforated panels by local resonances. (15th February 2019) Authors: Ren, S.W.; Van Belle, L.; Claeys, C.; Xin, F.X.; Lu, T.J.; Deckers, E.; Desmet, W. Journal: Mechanical systems and signal processing Issue: Volume 117(2019) Page Start: 138 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
16. Low Frequency Noise Analysis of Impact of Metal Gate Processing on the Gate Oxide Stack Quality. (17th February 2018) Authors: Claeys, C.; He, L.; O'Sullivan, B. J.; Veloso, A.; Horiguchi, N.; Collaert, N.; Simoen, E. Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: Q26 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
17. Low Frequency Noise Analysis of Impact of Metal Gate Processing on the Gate Oxide Stack Quality. (1st January 2018) Authors: Claeys, C.; He, L.; O'Sullivan, B. J.; Veloso, A.; Horiguchi, N.; Collaert, N.; Simoen, E. Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 3(2018) Page Start: Q26 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
18. Low-Frequency Noise Assessment of the Oxide Trap Density in Thick-Oxide Input-Output Transistors for DRAM Applications. (1st January 2016) Authors: Simoen, E.; Ritzenthaler, R.; Cho, M.-J.; Schram, T.; Horiguchi, N.; Aoulaiche, M.; Spessot, A.; Fazan, P.; Claeys, C. Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 6(2016) Page Start: N27 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
19. Low-Frequency Noise Assessment of the Oxide Trap Density in Thick-Oxide Input-Output Transistors for DRAM Applications. (31st March 2016) Authors: Simoen, E.; Ritzenthaler, R.; Cho, M.-J.; Schram, T.; Horiguchi, N.; Aoulaiche, M.; Spessot, A.; Fazan, P.; Claeys, C. Journal: ECS journal of solid state science and technology Issue: Volume 5:Number 6(2016) Page Start: N27 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
20. Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks. (1st January 2019) Authors: Claeys, C.; Ritzenthaler, R.; Schram, T.; Arimura, H.; Horiguchi, N.; Simoen, E. Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 2(2019) Page Start: N25 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗