1. Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma. (January 2015) Authors: Garay, Adrian Adalberto; Hwang, Su Min; Chung, Chee Won Journal: Vacuum Issue: Volume 111(2015) Page Start: 19 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma. (January 2015) Authors: Garay, Adrian Adalberto; Hwang, Su Min; Chung, Chee Won Journal: Vacuum Issue: Volume 111(2015) Page Start: 19 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Effect of the addition of O2 on copper etching using high density plasma of acetylacetonate/Ar. (December 2022) Authors: Park, Sung Yong; Lim, Eun Taek; Kim, Seung Hyun; Chung, Chee Won Journal: Materials science in semiconductor processing Issue: Volume 152(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Etch Characteristics of Copper Thin Films in Inductively Coupled Plasma of Piperidine/Ethanol/Ar Gas Mixture. (20th May 2021) Authors: Lim, Eun Taek; Lee, Ji Soo; Park, Sung Yong; Chung, Chee Won Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 5(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Highly anisotropic etching of Ta thin films using high density plasmas of halogen based gases. (November 2016) Authors: Choi, Ji Hyun; Hwang, Su Min; Lee, Jai Yong; Garay, Adrian Adalberto; Chung, Chee Won Journal: Vacuum Issue: Volume 133(2016) Page Start: 18 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Inductively coupled plasma reactive ion etching of CoFeB magnetic thin films in a CH3COOH/Ar gas mixture. (September 2015) Authors: Garay, Adrian Adalberto; Hwang, Su Min; Choi, Ji Hyun; Min, Byoung Chul; Chung, Chee Won Journal: Vacuum Issue: Volume 119(2015) Page Start: 151 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma. (November 2020) Authors: Cha, Moon Hwan; Lim, Eun Taek; Park, Sung Yong; Lee, Ji Su; Chung, Chee Won Journal: Vacuum Issue: Volume 181(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas. (12th August 2015) Authors: Garay, Adrian Adalberto; Choi, Ji Hyun; Hwang, Su Min; Chung, Chee Won Journal: ECS Solid State Letters Issue: Volume 4:Number 10(2015) Page Start: P77 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas. (1st January 2015) Authors: Garay, Adrian Adalberto; Choi, Ji Hyun; Hwang, Su Min; Chung, Chee Won Journal: ECS Solid State Letters Issue: Volume 4:Number 10(2015) Page Start: P77 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Influence of C2F6 Addition to Cl2/Ar Gas on Nanometer-Scale Etch Characteristics of TiN Thin Films Using Inductively Coupled Plasma. (13th June 2018) Authors: Choi, Jae Sang; Cho, Doo Hyeon; Lim, Eun Taek; Chung, Chee Won Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 6(2018) Page Start: P339 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗