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3. Back Cover: Plasma Process. Polym. 4–5∕2017. Issue 4 (25th April 2017)

4. Back Picture: Plasma Process. Polym. 4–5∕2017. Issue 4 (25th April 2017)

8. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures. Issue 11 (4th August 2021)

10. Experimental and Theoretical Study of the Plasma Chemistry of Ethyl Lactate Plasma Polymerization Discharges. Issue 5 (9th December 2014)