Back Picture: Plasma Process. Polym. 4–5∕2017. Issue 4 (25th April 2017)

• Record Type: Journal Article
• Authors: Georgieva, Violeta; Berthelot, Antonin; Silva, Tiago; Kolev, Stanimir; Graef, Wouter; Britun, Nikolay; Chen, Guoxing; van der Mullen, Joost; Godfroid, Thomas; Mihailova, Diana; van Dijk, Jan; Snyders, Rony; Bogaerts, Annemie; Delplancke‐Ogletree, Marie‐Paule
• Other Names: Bogaerts Annemie guestEditor.; Alves Luís Lemos guestEditor.
• Is Part Of: Plasma processes and polymers. Volume 14:Issue 4/5(2017)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2017-04-25
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201770007
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract : Back Cover: Cross‐sectional view of a microwave plasma column at a pressure of 933 Pa. The Ar, N2 or CO2 plasma is sustained by a surfaguide launcher. Modeling shows that the power is deposited along the plasma‐dielectric boundary (the tube wall), where the surface wave propagates. This paper presents and benchmarks two 2‐dimensional models (quasi‐neutral and plasma bulk‐sheath, both accounting for the gas flow) for Ar microwave plasma and compares the results with the experiment. Further details can be found in the article by V. Georgieva et al. at1600185 .