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2. Increase in Oxide Trap Density Due to the Implementation of High-k and Al2O3 Cap Layers in Thick-Oxide Input-Output Transistors for DRAM Applications. (14th September 2015)

4. Towards single‐trap spectroscopy: Generation‐recombination noise in UTBOX SOI nMOSFETs. Issue 3 (23rd January 2015)