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APA Citation
Yang, T., Lin, Z., Tsai, S., Dai, J., Chen, S., Lin, M., & Chen, S. (2023). deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics. Materials science in semiconductor processing, 162, . http://access.bl.uk/ark:/81055/vdc_100185070016.0x00000e