A steep-switching impact ionization-based threshold switching field-effect transistor. Issue 12 (1st March 2023)
- Record Type:
- Journal Article
- Title:
- A steep-switching impact ionization-based threshold switching field-effect transistor. Issue 12 (1st March 2023)
- Main Title:
- A steep-switching impact ionization-based threshold switching field-effect transistor
- Authors:
- Kang, Chanwoo
Choi, Haeju
Son, Hyeonje
Kang, Taeho
Lee, Sang-Min
Lee, Sungjoo - Abstract:
- Abstract : A steep switching transistor (subthreshold swing, SS ∼32.8 mV dec −1 ) with low dielectric injection efficiency (Δ I GS /Δ I DS ∼10 −6 is constructed by connecting an MoS2 FET and a WSe2 impact-ionisation based threshold switch. Abstract : A steep switching device with a low subthreshold swing (SS) that overcomes the fundamental Boltzmann limit ( kT / q ) is required to efficiently process a continuously increasing amount of data. Recently, two-dimensional material-based impact ionization transistors with various structures have been reported with the advantages of a low critical electric field and a unique quantum confinement effect. However, most of them cannot retain steep switching at room temperature, and device performance degradation issues caused by impact ionization-induced hot carriers have not been structurally addressed. In this study, we presented an impact-ionization-based threshold switching field-effect transistor (I 2 S-FET) fabricated with a serial connection of a MoS2 FET and WSe2 impact ionization-based threshold switch (I 2 S). We obtained repetitive operation with low SS (32.8 mV dec −1 ) at room temperature, along with low dielectric injection efficiency (10 −6 ), through a structural design with separation of the conducting region, which determines on-state carrier transport, and the steep-switching region where the transition from off- to on-state occurs via impact ionization. Furthermore, compared to previously reportedAbstract : A steep switching transistor (subthreshold swing, SS ∼32.8 mV dec −1 ) with low dielectric injection efficiency (Δ I GS /Δ I DS ∼10 −6 is constructed by connecting an MoS2 FET and a WSe2 impact-ionisation based threshold switch. Abstract : A steep switching device with a low subthreshold swing (SS) that overcomes the fundamental Boltzmann limit ( kT / q ) is required to efficiently process a continuously increasing amount of data. Recently, two-dimensional material-based impact ionization transistors with various structures have been reported with the advantages of a low critical electric field and a unique quantum confinement effect. However, most of them cannot retain steep switching at room temperature, and device performance degradation issues caused by impact ionization-induced hot carriers have not been structurally addressed. In this study, we presented an impact-ionization-based threshold switching field-effect transistor (I 2 S-FET) fabricated with a serial connection of a MoS2 FET and WSe2 impact ionization-based threshold switch (I 2 S). We obtained repetitive operation with low SS (32.8 mV dec −1 ) at room temperature, along with low dielectric injection efficiency (10 −6 ), through a structural design with separation of the conducting region, which determines on-state carrier transport, and the steep-switching region where the transition from off- to on-state occurs via impact ionization. Furthermore, compared to previously reported threshold-switching devices, our device demonstrated hysteresis-free switching characteristics. This study provides a promising approach for developing next-generation energy-efficient electronic devices and ultralow-power applications. … (more)
- Is Part Of:
- Nanoscale. Volume 15:Issue 12(2023)
- Journal:
- Nanoscale
- Issue:
- Volume 15:Issue 12(2023)
- Issue Display:
- Volume 15, Issue 12 (2023)
- Year:
- 2023
- Volume:
- 15
- Issue:
- 12
- Issue Sort Value:
- 2023-0015-0012-0000
- Page Start:
- 5771
- Page End:
- 5777
- Publication Date:
- 2023-03-01
- Subjects:
- Nanoscience -- Periodicals
Nanotechnology -- Periodicals
620.505 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/NR/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d2nr06547a ↗
- Languages:
- English
- ISSNs:
- 2040-3364
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9830.266000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 26839.xml