Cite
HARVARD Citation
Stange, H. et al. (2016). Diffusion-induced grain boundary migration as mechanism for grain growth and defect annihilation in chalcopyrite thin films. Acta materialia. pp. 377-384. [Online].
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Stange, H. et al. (2016). Diffusion-induced grain boundary migration as mechanism for grain growth and defect annihilation in chalcopyrite thin films. Acta materialia. pp. 377-384. [Online].