Time evolution of donor activation at low temperatures with co-implantation of phosphorus and hydrogen in silicon. (April 2023)
- Record Type:
- Journal Article
- Title:
- Time evolution of donor activation at low temperatures with co-implantation of phosphorus and hydrogen in silicon. (April 2023)
- Main Title:
- Time evolution of donor activation at low temperatures with co-implantation of phosphorus and hydrogen in silicon
- Authors:
- Lee, Bo-Wen
Lin, Jui-Chang
Chang, Ruey-Dar
Chu, Che-Men
Woon, Wei-Yen - Abstract:
- Abstract: We report on the study of the donor activation behavior at low temperatures using subamorphizing implantation of phosphorus and hydrogen to develop three-dimensional integrated circuits. We show that the activation efficiency of phosphorus 0° implantation angle is superior to that at 7° due to the broad defect and donor profiles. At 370 °C, the carrier concentration was enhanced by hydrogen co-implantation at a dose of 10 15 cm −2 . However, the enhancement quickly decayed, and the carrier concentration at 400 °C was lower than that in the sample without hydrogen. The change in the activation behavior suggests that the enhancement in the carrier concentration was due to the defect complexes generated by hydrogen implantation. By eliminating defect complexes, the passivation of phosphorus by hydrogen atoms became evident. At 500 °C, hydrogen caused phosphorus deactivation at the beginning of the annealing process. The carrier concentration then recovered, indicating dehydrogenation during further annealing. Highlights: Phosphorus activation at an implantation angle of 0° angle is better that at 7°. High-dose hydrogen co-implantation enhances the carrier concentration at the beginning of annealing at 370 and 400 °C. Passivation of phosphorus by hydrogen was observed during extended annealing at 400 °C. Two donor activation mechanisms associated with hydrogen co-implantation were observed.
- Is Part Of:
- Materials science in semiconductor processing. Volume 157(2023)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 157(2023)
- Issue Display:
- Volume 157, Issue 2023 (2023)
- Year:
- 2023
- Volume:
- 157
- Issue:
- 2023
- Issue Sort Value:
- 2023-0157-2023-0000
- Page Start:
- Page End:
- Publication Date:
- 2023-04
- Subjects:
- Phosphorus -- Activation -- Ion implantation -- Hydrogen -- Defect
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2023.107332 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 25823.xml