Cite
HARVARD Citation
Koo, J. et al. (2020). Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film. Scripta materialia. pp. 256-261. [Online].
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Koo, J. et al. (2020). Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film. Scripta materialia. pp. 256-261. [Online].