Evaluation of an Nd doping effect on characteristic properties of tin oxide. (February 2015)

• Record Type: Journal Article
• Authors: Turgut, G.; Sonmez, E.; Duman, S.
• Is Part Of: Materials science in semiconductor processing. Volume 30(2015:Feb.)
• Page Start: 233
• Page End: 241
• Publication Date: 2015-02
• Subjects: Tin oxide -- Nd doping -- Structural properties -- Williamson–Hall method -- Spray pyrolysis; Semiconductors -- Periodicals; Integrated circuits -- Materials -- Periodicals; Semiconducteurs -- Périodiques; Circuits intégrés -- Matériaux -- Périodiques; Electronic journals; 621.38152
• DOI: 10.1016/j.mssp.2014.10.008
• Languages: English
• ISSNs: 1369-8001

Abstract

Abstract: In the present work, transparent and conductive Nd doped SnO2 thin films were deposited via spray pyrolysis. Crystallographic, morphological, optical and electrical characterizations of SnO2 were researched as a function of Nd doping. The XRD analysis indicated the films had tetragonal cassiterite tin oxide structure and (211) preferential direction for NdTO-0, NdTO-1, NdTO-2 and NdTO-3 samples changed to (110) plane for NdTO-4 and NdTO-5 samples. The crystalline size and strain analysis were made by using a Williamson–Hall method. The SEM micrographs showed that all films had homogenously scattered pyramidal and small densely nanoparticles. The optical analysis indicated optical band gap value of undoped film increased with 1 at% Nd doping and then it decreased with more Nd content. The Hall measurements indicated that the highest electrical conductivity was obtained for 2 at% Nd doping content.