High-κ SrTiO3 thin film as gate dielectric of a solution processed SnO2 thin film transistor. (1st March 2023)
- Record Type:
- Journal Article
- Title:
- High-κ SrTiO3 thin film as gate dielectric of a solution processed SnO2 thin film transistor. (1st March 2023)
- Main Title:
- High-κ SrTiO3 thin film as gate dielectric of a solution processed SnO2 thin film transistor
- Authors:
- Acharya, Vishwas
Pal, Nila
Pandey, Utkarsh
Yadav, Akhilesh Kumar
Suthar, Mukesh
Roy, Pradip Kumar
Biring, Sajal
Pal, Bhola N. - Abstract:
- Abstract: High dielectric constant (high-κ) gate insulating material is an essential component for low operating voltage thin film transistor (TFT) fabrication. Among different high-κ materials, a number of perovskite oxides are widely studied due to their unusually high dielectric constant. Out of them, strontium titanate (SrTiO3 ) is a well-known perovskite oxide material that has both good insulating behaviors with a very high-κ value. This work demonstrated the SrTiO3 thin film deposition by simple solution processed technique and its application for sol-gel derived SnO2 TFT fabrication. Although this SnO2 TFT can be operated within a low voltage range (<2 V) due to the high-κ value of SrTiO3 thin film, the device can be operating in the high voltage range (>15 V) as well because of its high breakdown voltage. Experimental data of this study indicates, in the low voltage range (<2 V), both output and transfer characteristics of the devices are hysteresis free. However, in the higher voltage range (>5 V), TFT characteristics show some hysteresis. An optimized TFT has carrier mobility ∼0.20 cm 2 /V.s. with an On/Off ratio of 2.3 × 10 4 in the low operating voltage range (<2 V) range. Whereas, carrier mobility is reduced a bit in the higher voltage range with a lower On/Off ratio due to the interface charge trapping.
- Is Part Of:
- Materials science in semiconductor processing. Volume 155(2023)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 155(2023)
- Issue Display:
- Volume 155, Issue 2023 (2023)
- Year:
- 2023
- Volume:
- 155
- Issue:
- 2023
- Issue Sort Value:
- 2023-0155-2023-0000
- Page Start:
- Page End:
- Publication Date:
- 2023-03-01
- Subjects:
- Thin film transistor -- Perovskite oxide -- Metal oxide semiconductor -- Sol-gel -- Low operating voltage
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2022.107228 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 24707.xml