Structural characteristics of 3C–SiC thin films grown on Si-face and C-face 4H–SiC substrates by high temperature chemical vapor deposition. (January 2023)
- Record Type:
- Journal Article
- Title:
- Structural characteristics of 3C–SiC thin films grown on Si-face and C-face 4H–SiC substrates by high temperature chemical vapor deposition. (January 2023)
- Main Title:
- Structural characteristics of 3C–SiC thin films grown on Si-face and C-face 4H–SiC substrates by high temperature chemical vapor deposition
- Authors:
- Feng, Zhe Chuan
Lin, Hao-Hsiung
Xin, Bin
Tsai, Shi-Jane
Saravade, Vishal
Yiin, Jeffrey
Klein, Benjamin
Ferguson, Ian T. - Abstract:
- Abstract: Hetero-epitaxy of 3C–SiC on Si-face and C-face 4H–SiC is experimentally investigated and corresponding growth model is identified. This study of polytypes of SiC will be useful for band-gap engineering, optical, electrical, and electronic applications of SiC. 3C–SiC was epitaxially deposited on 4H–SiC using a high temperature chemical vapor deposition. The primary factor affecting the epi-quality on Si-face SiC is double positioning boundary (DPB) defect. An adatom migration model elucidates the formation of the V-shaped DPB defect structures. On C-terminated 4H–SiC, super-V-shaped-structure (SVSS) defects and polycrystalline complexes in 3C–SiC are formed. These characteristics of 3C–SiC are measured and analyzed using transmission electron microscopy, X-ray diffraction, atomic force microscopy, and scanning electron microscopy techniques. A model considering adatoms' migration in step-flow direction and anti-step-flow direction explains the SVSS defects. Effects of both step-flow and anti-step-flow growth mode on the atom adsorption near the step edge are discussed. Highlights: 3C–SiC films on Si- and C-face 4H–SiC grown by high temperature chemical vapor deposition. Penetrating characterization using TEM, XRD, AFM, SEM, and analyses. Double positioning boundary, Super-V-shaped-structure and polycrystalline complexes defects investigated in depth. Atomic-structure model proposed to demonstrate the observed twinning structure. Modeling adatoms' migration inAbstract: Hetero-epitaxy of 3C–SiC on Si-face and C-face 4H–SiC is experimentally investigated and corresponding growth model is identified. This study of polytypes of SiC will be useful for band-gap engineering, optical, electrical, and electronic applications of SiC. 3C–SiC was epitaxially deposited on 4H–SiC using a high temperature chemical vapor deposition. The primary factor affecting the epi-quality on Si-face SiC is double positioning boundary (DPB) defect. An adatom migration model elucidates the formation of the V-shaped DPB defect structures. On C-terminated 4H–SiC, super-V-shaped-structure (SVSS) defects and polycrystalline complexes in 3C–SiC are formed. These characteristics of 3C–SiC are measured and analyzed using transmission electron microscopy, X-ray diffraction, atomic force microscopy, and scanning electron microscopy techniques. A model considering adatoms' migration in step-flow direction and anti-step-flow direction explains the SVSS defects. Effects of both step-flow and anti-step-flow growth mode on the atom adsorption near the step edge are discussed. Highlights: 3C–SiC films on Si- and C-face 4H–SiC grown by high temperature chemical vapor deposition. Penetrating characterization using TEM, XRD, AFM, SEM, and analyses. Double positioning boundary, Super-V-shaped-structure and polycrystalline complexes defects investigated in depth. Atomic-structure model proposed to demonstrate the observed twinning structure. Modeling adatoms' migration in step-flow/anti-step-flow demonstrated Super-V-shaped-structure defects. … (more)
- Is Part Of:
- Vacuum. Volume 207(2023)
- Journal:
- Vacuum
- Issue:
- Volume 207(2023)
- Issue Display:
- Volume 207, Issue 2023 (2023)
- Year:
- 2023
- Volume:
- 207
- Issue:
- 2023
- Issue Sort Value:
- 2023-0207-2023-0000
- Page Start:
- Page End:
- Publication Date:
- 2023-01
- Subjects:
- 3C–SiC on 4H–SiC -- Chemical vapor deposition -- Transmission electron microscopy -- X-ray diffraction -- Atomic force microscopy -- And scanning electron microscopy
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2022.111643 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 24463.xml