Ultra‐Confined Catalytic Growth Integration of Sub‐10 nm 3D Stacked Silicon Nanowires Via a Self‐Delimited Droplet Formation Strategy (Small 42/2022). Issue 42 (20th October 2022)

• Record Type: Journal Article
• Authors: Hu, Ruijin; Liang, Yifei; Qian, Wentao; Gan, Xin; Liang, Lei; Wang, Junzhuan; Liu, Zongguang; Shi, Yi; Xu, Jun; Chen, Kunji; Yu, Linwei
• Is Part Of: Small. Volume 18:Issue 42(2022)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2022-10-20
• Subjects: 3D integration -- catalytic growth -- in‐plane solid‐liquid‐solid -- ultrathin Si nanowires; Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.202270222
• Languages: English
• ISSNs: 1613-6810

Abstract

Abstract : Droplet Control In article number 2204390, Linwei Yu and co‐workers successfully demonstrate stacked growth integration of ultrathin silicon nanowires, with width and height of W nw = 9.9 ± 1.2 nm (down to 8 nm) and H nw = 18.8 ± 1.8 nm approaching to the critical‐dimension of 10 nm technology node, thanks to a self‐delimited droplet control strategy, with tunable channel cross‐sections, which are ideal candidates for monolithic 3D integration of logic‐in‐memory and neuromorphic applications.