Source material valuation of charge plasma based DG-TFET for RFIC applications. (1st September 2022)
- Record Type:
- Journal Article
- Title:
- Source material valuation of charge plasma based DG-TFET for RFIC applications. (1st September 2022)
- Main Title:
- Source material valuation of charge plasma based DG-TFET for RFIC applications
- Authors:
- Goyal, Preeti
Srivastava, Garima
Madan, Jaya
Pandey, Rahul
Gupta, R S - Abstract:
- Abstract: This paper seeks to present a comprehensive analysis to check the viability of four different source materials in a charge plasma-based double gate tunnel field effect transistor (CP-DGTFET) as RF/microwave systems components. This work aims to provide a comparative study of the electrical and analog parameters of three devices (labeled as D-II, D-III, D-IV) with Si0.5 Ge0.5, Ge, Mg2 Si as the source material with a conventional Si source homojunction CP-DGTFET (referred as D-I). In addition, linearity and distortion are investigated. The selection of the source material illustrates the effect on the band structure at heterojunctions, as a combined effect of low bandgap and electron affinities of the material used. Results obtained through numerical simulations show that the device D-IV with Mg2 Si source shows excellent performance parameters with maximum I ON (4.6 × 10 −3 A µ m −1 ) and minimum V th (0.26 V). Also, the switching ratio (10 13 ) and SS (10.89 mV/decade) offered by D-IV is the best among all four devices investigated. Various linearity FOM's viz. transconductance and its higher order derivatives ( g m, g m2, g m3 ), higher order voltage intercept points ( V IP2, V IP3 ), third-order intercept input power, third-order intermodulation distortion, 1 dB compression point, 2nd and 3rd order harmonic distortion, and total harmonic distortions (THD) have also been examined. All of this research was carried out using the Atlas Silvaco simulation tool. ThisAbstract: This paper seeks to present a comprehensive analysis to check the viability of four different source materials in a charge plasma-based double gate tunnel field effect transistor (CP-DGTFET) as RF/microwave systems components. This work aims to provide a comparative study of the electrical and analog parameters of three devices (labeled as D-II, D-III, D-IV) with Si0.5 Ge0.5, Ge, Mg2 Si as the source material with a conventional Si source homojunction CP-DGTFET (referred as D-I). In addition, linearity and distortion are investigated. The selection of the source material illustrates the effect on the band structure at heterojunctions, as a combined effect of low bandgap and electron affinities of the material used. Results obtained through numerical simulations show that the device D-IV with Mg2 Si source shows excellent performance parameters with maximum I ON (4.6 × 10 −3 A µ m −1 ) and minimum V th (0.26 V). Also, the switching ratio (10 13 ) and SS (10.89 mV/decade) offered by D-IV is the best among all four devices investigated. Various linearity FOM's viz. transconductance and its higher order derivatives ( g m, g m2, g m3 ), higher order voltage intercept points ( V IP2, V IP3 ), third-order intercept input power, third-order intermodulation distortion, 1 dB compression point, 2nd and 3rd order harmonic distortion, and total harmonic distortions (THD) have also been examined. All of this research was carried out using the Atlas Silvaco simulation tool. This study reveals that the Mg2 Si source CP-DGTFET is best suited for high-frequency, low-power and high linearity applications in modern communication systems. … (more)
- Is Part Of:
- Semiconductor science and technology. Volume 37:Number 9(2022)
- Journal:
- Semiconductor science and technology
- Issue:
- Volume 37:Number 9(2022)
- Issue Display:
- Volume 37, Issue 9 (2022)
- Year:
- 2022
- Volume:
- 37
- Issue:
- 9
- Issue Sort Value:
- 2022-0037-0009-0000
- Page Start:
- Page End:
- Publication Date:
- 2022-09-01
- Subjects:
- charge plasma (CP) -- double gate (DG) -- short channel effects (SCE) -- linearity parameter -- band to band tunneling (BTBT) -- doping less (DP)
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/0268-1242/1 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6641/ac7ede ↗
- Languages:
- English
- ISSNs:
- 0268-1242
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 23596.xml