Cite
HARVARD Citation
Wang, H. et al. (2022). Characteristics of 22 nm UTBB-FDSOI technology with an ultra-wide temperature range. Semiconductor science and technology. p. . [Online].
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Wang, H. et al. (2022). Characteristics of 22 nm UTBB-FDSOI technology with an ultra-wide temperature range. Semiconductor science and technology. p. . [Online].