Cite
HARVARD Citation
Takizawa, Y. et al. (2022). Lowest Concentration of Chlorine Trifluoride Gas for Cleaning Silicon Carbide Chemical Vapor Deposition Reactor. ECS journal of solid state science and technology. p. . [Online].
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Takizawa, Y. et al. (2022). Lowest Concentration of Chlorine Trifluoride Gas for Cleaning Silicon Carbide Chemical Vapor Deposition Reactor. ECS journal of solid state science and technology. p. . [Online].