Reconfigurable Radio‐Frequency High‐Electron Mobility Transistors via Ferroelectric‐Based Gallium Nitride Heterostructure. (10th April 2022)
- Record Type:
- Journal Article
- Title:
- Reconfigurable Radio‐Frequency High‐Electron Mobility Transistors via Ferroelectric‐Based Gallium Nitride Heterostructure. (10th April 2022)
- Main Title:
- Reconfigurable Radio‐Frequency High‐Electron Mobility Transistors via Ferroelectric‐Based Gallium Nitride Heterostructure
- Authors:
- Yang, Jeong Yong
Yeom, Min Jae
Lee, Jaeyong
Lee, Kyusang
Park, Changkun
Heo, Junseok
Yoo, Geonwook - Abstract:
- Abstract: The wireless communication and power transmission environment varies widely depending on time and place, and thus reconfigurable devices and circuits are in high demand due to the significant increase in complexity of the power stage and chip size required for current non‐reconfigurable device‐based systems. Reconfigurable radio‐frequency (RF) devices, however, are difficult to demonstrate due to the lack of suitable materials with desirable material properties that can also be integrated with conventional high‐power materials. Here, reconfigurable gallium nitride (GaN) high‐electron mobility transistors (HEMTs) that are heterointegrated with 2D van der Waals‐interfaced α‐In2 Se3 semiconductor are demonstrated. The switchable ferroelectric polarization of the 2D α‐In2 Se3 layer is exploited to control the 2D electron gas charge density in the GaN channel. Further, a native interfacial indium oxide layer between the gate dielectric and α‐In2 Se3 functions as a charge trapping layer, boosting the effect of the ferroelectric α‐In2 Se3 layer. The fabricated HEMTs exhibit the sharpest subthreshold slope with tunable threshold voltage, transconductance, and maximum frequency in the range of several GHz under the application of a fast pulsed gate‐voltage signal without sacrificing the performance. The results clearly demonstrate the immense potential of ferroelectric‐based mixed‐dimensional heterostructures as a viable pathway toward simple and compact reconfigurable RFAbstract: The wireless communication and power transmission environment varies widely depending on time and place, and thus reconfigurable devices and circuits are in high demand due to the significant increase in complexity of the power stage and chip size required for current non‐reconfigurable device‐based systems. Reconfigurable radio‐frequency (RF) devices, however, are difficult to demonstrate due to the lack of suitable materials with desirable material properties that can also be integrated with conventional high‐power materials. Here, reconfigurable gallium nitride (GaN) high‐electron mobility transistors (HEMTs) that are heterointegrated with 2D van der Waals‐interfaced α‐In2 Se3 semiconductor are demonstrated. The switchable ferroelectric polarization of the 2D α‐In2 Se3 layer is exploited to control the 2D electron gas charge density in the GaN channel. Further, a native interfacial indium oxide layer between the gate dielectric and α‐In2 Se3 functions as a charge trapping layer, boosting the effect of the ferroelectric α‐In2 Se3 layer. The fabricated HEMTs exhibit the sharpest subthreshold slope with tunable threshold voltage, transconductance, and maximum frequency in the range of several GHz under the application of a fast pulsed gate‐voltage signal without sacrificing the performance. The results clearly demonstrate the immense potential of ferroelectric‐based mixed‐dimensional heterostructures as a viable pathway toward simple and compact reconfigurable RF systems. Abstract : Reconfigurable radio‐frequency (RF) gallium nitride high‐electron mobility transistors (HEMTs) heterointegrated with a two‐dimensional ferroelectric semiconductor are demonstrated. The fabricated HEMTs exhibit the sharpest subthreshold slope with tunable threshold voltage, transconductance, and maximum frequency in the range of several GHz under a fast pulsed gate‐voltage signal. The tunability is exploited to show reconfigurable RF characteristics toward wireless communication and power transmission applications. … (more)
- Is Part Of:
- Advanced Electronic Materials. Volume 8:Number 9(2022)
- Journal:
- Advanced Electronic Materials
- Issue:
- Volume 8:Number 9(2022)
- Issue Display:
- Volume 8, Issue 9 (2022)
- Year:
- 2022
- Volume:
- 8
- Issue:
- 9
- Issue Sort Value:
- 2022-0008-0009-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-04-10
- Subjects:
- α‐In 2Se 3 -- ferroelectric -- GaN -- mixed‐dimensional -- reconfigurable
Materials -- Electric properties -- Periodicals
Materials science -- Periodicals
Magnetic materials -- Periodicals
Electronic apparatus and appliances -- Periodicals
537 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2199-160X ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/aelm.202101406 ↗
- Languages:
- English
- ISSNs:
- 2199-160X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.848400
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 23399.xml