Cite
HARVARD Citation
Badali, Y. et al. (2022). Plasma-enhanced atomic layer deposition of amorphous Ga2O3 gate dielectrics. Journal of physics and chemistry of solids. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Badali, Y. et al. (2022). Plasma-enhanced atomic layer deposition of amorphous Ga2O3 gate dielectrics. Journal of physics and chemistry of solids. p. . [Online].