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APA Citation
Lewis, S. M., DeRose, G. A., Alty, H. R., Hunt, M. S., Lee, N., Mann, J. A., Grindell, R., Wertheim, A., De Rose, L., Fernandez, A., Muryn, C. A., Whitehead, G. F. S., Timco, G. A., Scherer, A., & Winpenny, R. E. P. (2022). tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography. Advanced functional materials, 32, n/a. http://access.bl.uk/ark:/81055/vdc_100161678323.0x000014