Cite
HARVARD Citation
Konishi, J. et al. (2016). Electrical Properties of Al2O3 Incorporated CeO2 Thin Films Deposited by RF Magnetron Sputtering. ECS transactions. pp. 279-285. [Online].
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Konishi, J. et al. (2016). Electrical Properties of Al2O3 Incorporated CeO2 Thin Films Deposited by RF Magnetron Sputtering. ECS transactions. pp. 279-285. [Online].