Environmental-Friendly Fluorine Mixture for CVD Cleaning Processes to Replace C2F6, CF4 and NF3. (28th July 2016)

• Record Type: Journal Article
• Authors: Wieland, Robert; Pittroff, Michael; Boudaden, Jamila; Altmannshofer, Stephan; Kutter, Christoph
• Is Part Of: ECS transactions. Volume 72:Number 19(2016)
• Page Start: 23
• Page End: 34
• Publication Date: 2016-07-28
• Subjects: Electrochemistry -- Periodicals; Electrochemistry; Periodicals; Electronic journals; Electronic journal; 541.37
• DOI: 10.1149/07219.0023ecst
• Languages: English
• ISSNs: 1938-5862

Abstract

Abstract : The target of this work was to find viable alternative CVD-cleaning gas mixtures for the semiconductor industry, which are environmental-friendly and in addition can be used as a "drop in" to avoid high investment costs from equipment modification. Our study has demonstrated that this can be achieved with F2 -based gas mixtures, which also provide a more efficient and faster cleaning behavior for most applications. A cleaning efficiency gain of a factor 1.3 up to 17 can be expected, relative to the F2 -amount required for cleaning. This gain in efficiency depends on the cleaning gas to be replaced and on the reactor type. A shorter cleaning time can lead into a higher equipment throughput and more cost effective usage of thin film tools. To generate data on particle and tool attrition, a first "mini marathon" test run has been performed. The test reactor, a 200mm wafer size CVD tool, was equipped with a mass spectrometer to monitor the end point of the chamber cleaning and to gain an overview of the waste gases going into the abatement system