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APA Citation
Boureau, V., Benoit, D., & Claverie, A. (2018). impact of Some Processing Steps onto the Strain Distributions in FD-SOI CMOS Planar Devices: A Contribution of Dark-Field Electron Holography. ECS journal of solid state science and technology, 7, P473–P479. http://access.bl.uk/ark:/81055/vdc_100160134793.0x00000e