Cite
MLA Citation
J. Kelly et al.. “Annealing and Impurity Effects in Co Thin Films for MOL Contact and BEOL Metallization.” Journal of the Electrochemical Society, vol. 166, no. 1, 2019, pp. D3100–D3109. http://access.bl.uk/ark:/81055/vdc_100160132995.0x00003a