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APA Citation
Hu, S., Chen, J., Yu, T., Zeng, Y., Wang, S., Guo, X., Yang, G., & Li, Y. (2022). a novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography. Journal of materials chemistry, 10(26), 9858–9866. http://access.bl.uk/ark:/81055/vdc_100159164290.0x000024