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HARVARD Citation
Hu, S. et al. (2022). A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography. Journal of materials chemistry. 10 (26), pp. 9858-9866. [Online].
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Hu, S. et al. (2022). A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography. Journal of materials chemistry. 10 (26), pp. 9858-9866. [Online].