Cite
MLA Citation
Kwan Hong Min et al.. “Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface.” Progress in photovoltaics, vol. 29, 2021, pp. 54–63. http://access.bl.uk/ark:/81055/vdc_100117919372.0x000039