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APA Citation
Okumura, H., Watanabe, Y., Shibata, T., Yoshizawa, K., Uedono, A., Tokunaga, H., Koseki, S., Arimura, T., Suihkonen, S., & Palacios, T. (2022). impurity diffusion in ion implanted AlN layers on sapphire substrates by thermal annealing. Japanese journal of applied physics, 61, . http://access.bl.uk/ark:/81055/vdc_100157263355.0x000061