Cite
HARVARD Citation
Okumura, H. et al. (2022). Impurity diffusion in ion implanted AlN layers on sapphire substrates by thermal annealing. Japanese journal of applied physics. p. . [Online].
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Okumura, H. et al. (2022). Impurity diffusion in ion implanted AlN layers on sapphire substrates by thermal annealing. Japanese journal of applied physics. p. . [Online].