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HARVARD Citation
Fang, J. et al. (2021). (3-Aminopropyl)trimethoxysilane Self-Assembled Monolayer as Barrier of Porous SiOCH for Electroless Cu Metallization: Optimizations of SiOCH Hydroxylation and Monolayer Functionalization. ECS journal of solid state science and technology. p. . [Online].