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HARVARD Citation
Kim, S. et al. (2022). Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand. Journal of materials chemistry. 10 (17), pp. 6696-6709. [Online].
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Kim, S. et al. (2022). Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand. Journal of materials chemistry. 10 (17), pp. 6696-6709. [Online].