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APA Citation
McFeely, C., Snelgrove, M., Shiel, K., Hughes, G., Yadav, P., Lundy, R., Morris, M. A., McGlynn, E., & O'Connor, R. (2022). rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers. Journal of materials chemistry, 10(19), 7476–7484. http://access.bl.uk/ark:/81055/vdc_100155160235.0x000015